东京电子 TEL T-3055DD 蚀刻机用途：用于半导体制造领域，通过蚀刻工艺精准去除晶圆表面特定材料，实现电路图案的转移，在芯片制造、集成电路生产等环节发挥关键作用，能满足逻辑芯片、存储芯片等不同产品的蚀刻需求。性能：电源规格为 208V AC，50/60Hz，1 相，功率 208W，电流 1A 。采用先进的等离子蚀刻技术，配备高精度气体流量控制系统和等离子体发生装置，可精准调控蚀刻速率与选择性，适用于多种半导体材料。独特的腔室设计减少蚀刻残留物，提升蚀刻均匀性，保障生产效率。能处理 6 至 12 英寸标准晶圆及部分特殊尺寸芯片、掩模版 。

Product Name: Tokyo Electron TEL T - 3055DD EtcherPurpose: It is used in the semiconductor manufacturing field. Through the etching process, it can accurately remove specific materials on the wafer surface to achieve the transfer of circuit patterns. It plays a key role in chip manufacturing, integrated circuit production and other processes, and can meet the etching requirements of different products such as logic chips and memory chips.Performance: The power supply specifications are 208V AC, 50/60Hz, single - phase, with a power of 208W and a current of 1A. It adopts advanced plasma etching technology and is equipped with a high - precision gas flow control system and a plasma generation device, which can precisely regulate the etching rate and selectivity and is suitable for a variety of semiconductor materials. The unique chamber design reduces etching residues and improves etching uniformity, ensuring production efficiency. It can process standard wafers from 6 to 12 inches and some special - sized chips and masks.