东京电子 TEL UNITY™ -EP/Ti.TiN 蚀刻机用途：用于半导体制造，针对 Ti（钛）和 TiN（氮化钛）等材料进行蚀刻。适用于逻辑芯片、DRAM、Flash 等产品生产，在介质蚀刻和硅蚀刻领域表现良好，能满足芯片制造中复杂精细结构的蚀刻需求 。性能：采用先进等离子蚀刻技术，配备高效气体控制系统与等离子体生成装置，可精准控制蚀刻速率与选择性，保障蚀刻过程一致性。其独特腔室设计，能减少蚀刻时杂质污染，提升蚀刻均匀性及产品良率。支持 150 至 300mm 晶圆尺寸，有多种配置选择，如每个系统最多 3 个工艺腔室，每个腔室最多 16 种工艺气体，还配备多种终点检测系统 。

Product Name: Tokyo Electron TEL UNITY™ -EP/Ti.TiN EtcherPurpose: It is used in semiconductor manufacturing for etching materials such as Ti (titanium) and TiN (titanium nitride). It is suitable for the production of products such as logic chips, DRAM, and Flash. It performs well in dielectric etching and silicon etching, and can meet the etching requirements for complex and fine structures in chip manufacturing.Performance: It adopts advanced plasma etching technology and is equipped with an efficient gas control system and a plasma generation device, which can precisely control the etching rate and selectivity to ensure the consistency of the etching process. Its unique chamber design can reduce impurity contamination during etching, improve etching uniformity and product yield. It supports wafer sizes from 150 to 300mm and has a variety of configuration options, such as up to 3 process chambers per system, up to 16 process gases per chamber, and is also equipped with a variety of endpoint detection systems.