东京精密 TOKYO SEIMITSU UF 3000用途：适用于半导体、材料研究、航天、电子元器件、汽车、光学器件等领域，可进行晶圆级在片测试等工作。性能：能兼容 8 英寸、12 英寸晶圆，综合精度达 2um。温度测试范围为 - 50℃～150℃ ，X/Y 轴最大速度 500mm/sec。其 XY 运动平台定位精度可达 ±0.5μm，重复定位精度≤0.3μm ，台面平整度≤3μm/300mm 。配备高清光学系统，放大倍数 50 - 1000 倍，可识别最小 30μm 间距测试点。采用花岗岩与铸铁复合基座，共振频率 600Hz 以上。探针臂 6 轴调节，微调精度 0.05μm，自动探针校准系统校准时间≤2 分钟，还集成双工位测试模块提升效率。

英文Product Name: TOKYO SEIMITSU UF 3000Purpose: It is applicable to fields such as semiconductors, materials research, aerospace, electronic components, automobiles, and optical devices, and can be used for in - wafer testing.Performance: It can be compatible with 8 - inch and 12 - inch wafers, with a comprehensive accuracy of 2um. The temperature test range is from - 50℃ to 150℃, and the maximum speed of the X/Y axis is 500mm/sec. The positioning accuracy of its XY motion platform can reach ±0.5μm, the repeat positioning accuracy is ≤0.3μm, and the tabletop flatness is ≤3μm/300mm. It is equipped with a high - definition optical system with a magnification of 50 - 1000 times, which can identify test points with a minimum pitch of 30μm. It adopts a composite base of granite and cast iron with a resonance frequency above 600Hz. The probe arm has 6 - axis adjustment with a fine - tuning accuracy of 0.05μm. The automatic probe calibration system has a calibration time of ≤2 minutes, and it also integrates a dual - station test module to improve efficiency.