OAI HYBRALIGN 500 掩模对准曝光系统用途：广泛用于半导体制造、MEMS、LED 以及生物芯片等微纳制造领域，主要功能是将掩模上的图案精确转移至晶圆或其他基板。性能：适配最大 6 英寸晶圆，拥有 ±2μm 的高精度对准能力，保证图案转移的精准度；曝光均匀性极佳，整个曝光区域光强偏差极小；支持接触式、接近式和投影式等多种曝光模式；曝光波长常见为 365nm（i-line），不同配置下波长有所不同，可满足各类光刻胶的波长需求。

Product Name: OAI HYBRALIGN 500 Mask Aligner and Exposure SystemPurpose: Widely used in micro - nano manufacturing fields such as semiconductor manufacturing, MEMS, LED, and biochip. Its main function is to accurately transfer the pattern on the mask to wafers or other substrates.Performance: It can be adapted to wafers with a maximum size of 6 inches and has a high - precision alignment ability of ±2μm to ensure the accuracy of pattern transfer. It has excellent exposure uniformity with minimal light intensity deviation in the entire exposure area. It supports multiple exposure modes such as contact, proximity, and projection exposure. The common exposure wavelength is 365nm (i - line), and the wavelength varies under different configurations to meet the wavelength requirements of various photoresists.