卡尔・休斯 KARL SUSS MICROTEC MJB-3 掩模对准曝光机用途：适用于科研实验室及小批量生产场景，可处理直径达 3 英寸的标准晶圆，也能加工厚度在 300μm - 1mm、尺寸小至 1cm² 的非标准基片，用于 MEMS、光电子、化合物半导体等微纳加工领域的光刻制程。性能：配备 350W 汞短弧灯，主要曝光波长 350 - 450nm，可选用 UV400 曝光光学元件（365nm 和 405nm）。在特定条件下分辨率可达 0.6μm ，对准精度达 0.1μm 。支持真空接触、硬接触、软接触和接近式（间隙有一定范围）曝光模式。操作控制设计简洁、符合人体工程学，通过显微镜观察样品和掩模，借助千分尺手动完成对准 。

Product Name: KARL SUSS MICROTEC MJB - 3 Mask AlignerPurpose: It is suitable for research laboratories and small - batch production scenarios. It can process standard wafers with a diameter of up to 3 inches, as well as non - standard substrates with a thickness of 300μm - 1mm and a size as small as 1cm². It is used for lithography processes in micro - nano processing fields such as MEMS, optoelectronics, and compound semiconductors.Performance: Equipped with a 350W mercury short - arc lamp, the main exposure wavelengths are 350 - 450nm, and UV400 exposure optics (365nm and 405nm) can be selected. The resolution can reach 0.6μm under specific conditions, and the alignment accuracy reaches 0.1μm. It supports vacuum contact, hard contact, soft contact, and proximity (with a certain gap range) exposure modes. The operation control is designed simply and ergonomically. Alignment is manually completed by observing the sample and mask through a microscope and using a micrometer.