尼康 NIKON Projection Aligner 投影光刻机用途：用于半导体制造领域，可将掩模版上的图案精确投影到晶圆上，完成光刻工艺，广泛应用于芯片制造的各个环节，如逻辑芯片、存储芯片、功率半导体及传感器芯片等制造。性能：不同型号性能有差异。例如部分机型采用特定波长光源（如 248nm KrF 准分子激光或 365nm i-line），搭配高数值孔径投影光学系统，分辨率可达 0.18μm 甚至更高；高精度对准系统能将晶圆与掩模版对准精度控制在 0.04μm 内；可处理 4 - 12 英寸晶圆，单次曝光视场有 22×22mm 等规格；每小时可处理大量晶圆，如 8 英寸晶圆每小时处理超 100 片，具备高效的量产能力 。

Product Name: NIKON Projection AlignerPurpose: It is used in the semiconductor manufacturing field. It can accurately project the patterns on the mask onto the wafer to complete the lithography process. It is widely applied to various aspects of chip manufacturing, such as the manufacturing of logic chips, memory chips, power semiconductors, and sensor chips.Performance: Performance varies among different models. For example, some models use specific wavelength light sources (such as 248nm KrF excimer laser or 365nm i - line), equipped with a high numerical aperture projection optical system, and the resolution can reach 0.18μm or even higher. The high - precision alignment system can control the alignment accuracy between the wafer and the mask within 0.04μm. It can process 4 - 12 - inch wafers, and the single - exposure field of view has specifications such as 22×22mm. It can process a large number of wafers per hour. For example, it can process more than 100 8 - inch wafers per hour, with high - efficiency mass - production capabilities.