阿斯麦 ASML 5500 / 60用途：这是一款 i-line 光刻步进系统，用于半导体芯片制造。可自动处理 100mm 晶圆盒，通过 365nm 近紫外光，将掩模版上的电路图形转移到晶圆表面的光刻胶上，以制造集成电路芯片，满足芯片设计和生产的光刻需求 。性能：能实现 450nm 的最小特征尺寸，光刻层之间的对齐精度达 90nm 。采用 5 倍缩小成像技术，每次曝光的最大芯片区域为 18mm×22.4mm 。在满足 0.45 微米设计规则的同时，每小时可处理多达 48 片 200mm 晶圆 。

Product Name: ASML 5500 / 60Purpose: This is an i-line lithography stepper system used in semiconductor chip manufacturing. It can automatically process 100mm wafer cassettes and transfer the circuit patterns on the photomask to the photoresist on the wafer surface through 365nm near-ultraviolet light to manufacture integrated circuit chips, meeting the lithography requirements of chip design and production.Performance: It can achieve a minimum feature size of 450nm, and the alignment accuracy between lithographic layers reaches 90nm. It uses 5x reduction imaging technology, and the maximum die area per exposure is 18mm×22.4mm. While meeting the 0.45-micron design rules, it can process up to 48 200mm wafers per hour.