迈达斯 MIDAS MDA-400LJ 掩模对准曝光机用途：适用于半导体及相关应用工艺，是高校和科研中心进行光刻实验较为理想且经济的工具。性能：采用手动与气动控制系统。可处理最大 4 英寸（100mm）直径的样品，适配最大 5 英寸 ×5 英寸的掩模版。配备紫外 LED 光源及电源，波长为 365nm（i-line）。有双 CCD 变焦显微镜和双显示器辅助操作。具备 XYZ 和 Theta 方向运动（千分尺调节）的对准工具模块以及楔形误差补偿系统（气浮式）。分辨率小于 1 微米，设备尺寸为 800（宽）×800（深）×800（高）mm ，重量 120kg。

Product Name: MIDAS MDA - 400LJ Mask AlignerPurpose: It is suitable for semiconductor and related application processes and is an ideal and cost - effective tool for universities and research centers to conduct lithography experiments.Performance: It adopts a manual and pneumatic control system. It can process samples with a maximum diameter of 4 inches (100mm) and is suitable for mask plates with a maximum size of 5 inches × 5 inches. It is equipped with a UV LED light source and power supply with a wavelength of 365nm (i - line). There are dual CCD zoom microscopes and dual monitors to assist in operation. It has an alignment tool module with XYZ and Theta direction movements (adjusted by micrometers) and a wedge error compensation system (air - floating type). The resolution is less than 1 micron. The device size is 800 (width) × 800 (depth) × 800 (height) mm and weighs 120kg.