卡尔・休斯 KARL SUSS MICROTEC MA-151 掩模对准曝光机用途：适用于半导体制造、MEMS（微机电系统）研发、光电子器件生产等微纳加工领域，用于将掩模上的图案精准转移到晶圆等基底材料表面，完成光刻制程。性能：可处理最大直径 150mm（6 英寸）的晶圆。配备 350W 高压汞灯，曝光波长 320nm 。有 X、Y 和 Theta 方向的微调旋钮控制晶圆台移动。具备标准软接触、标准硬接触、软真空和全真空 4 种晶圆与掩模接触模式。光学系统采用分视场旋转显微镜，搭配 3.5 倍、10 倍、25 倍物镜及 10 倍双目目镜，有分视场、全左图像、全右图像 3 种观察模式；红外对准系统含高强度色光源、两个用于背面照明的光纤照明器、红外探测器及观察电视摄像机。

Product Name: KARL SUSS MICROTEC MA - 151 Mask AlignerPurpose: It is suitable for micro - nano processing fields such as semiconductor manufacturing, MEMS (Micro - Electro - Mechanical Systems) R & D, and optoelectronic device production. It is used to accurately transfer the patterns on the mask to the surface of wafers and other substrate materials to complete the lithography process.Performance: It can handle wafers with a maximum diameter of 150mm (6 inches). It is equipped with a 350W high - pressure mercury lamp with an exposure wavelength of 320nm. There are fine - tuning knobs in the X, Y, and Theta directions to control the movement of the wafer stage. It has four wafer - to - mask contact modes: standard soft, standard hard, soft vacuum, and full vacuum. The optical system uses a split - field revolving microscope with 3.5x, 10x, 25x objectives and 10x binocular eyepieces, and has three viewing modes: split - field, full left - hand image, and full right - hand image. The IR alignment system includes a high - intensity chromatic light source, two fiber - optic illuminators for backside illumination, an IR detector, and a viewing TV camera.