OAI 5008 掩模对准曝光机用途：适用于半导体制造、MEMS（微机电系统）研发与生产、传感器制作等微纳加工领域，主要用于将掩模版上的图案精确转移到晶圆或其他基底材料表面，完成光刻工序。性能：虽然暂未获取到该型号全面且精准的官方性能参数，但参考同品牌其他型号产品推测，其可能具备较高精度的对准系统，能够实现微米级别的图案对准；大概率配备稳定可靠的曝光光源，以保证曝光过程中光强均匀性，确保图案转移的准确性；并且可能支持多种尺寸的晶圆或基底材料处理，具有较好的操作灵活性，以满足不同场景下的生产及研发需求。

Product Name: OAI 5008 Mask AlignerPurpose: It is suitable for micro - nano processing fields such as semiconductor manufacturing, R & D and production of MEMS (Micro - Electro - Mechanical Systems), and sensor fabrication. It is mainly used to accurately transfer the patterns on the mask to the surface of wafers or other substrate materials, completing the lithography process.Performance: Although comprehensive and accurate official performance parameters of this model have not been obtained yet, by referring to other models of the same brand, it is speculated that it may be equipped with a high - precision alignment system capable of achieving micron - level pattern alignment. It is highly likely to be equipped with a stable and reliable exposure light source to ensure the uniformity of light intensity during exposure and the accuracy of pattern transfer. It may also support the processing of wafers or substrate materials of various sizes, with good operational flexibility to meet the production and R & D requirements in different scenarios.