卡尔・休斯 KARL SUSS MICROTEC MA 150 M 掩模对准曝光机用途：适用于半导体制造、MEMS 研发、微纳结构制作等领域，可将掩模图案精准转移到最大 6 英寸（150mm）的晶圆及基底表面，完成光刻制程。常用于处理 2 - 6 英寸晶圆、芯片及非标准基底。性能：曝光光源有 350W 汞灯等多种选择，提供不同波长光线。显微镜配备 5x、10x、20x 等物镜，辅助精确对准。具备顶部对准功能。支持接近式、软接触、硬接触、真空接触等曝光模式。晶圆台有 X、Y、θ 微调器，可精准控制移动。能处理最大 6 英寸晶圆，兼容最大 7x7 英寸的掩模。有盒对盒传输功能，还具备楔形误差补偿系统，保障曝光的一致性 。

Product Name: KARL SUSS MICROTEC MA 150 M Mask AlignerPurpose: It is suitable for fields such as semiconductor manufacturing, MEMS R & D, and micro - nano structure fabrication. It can accurately transfer the mask pattern onto the surface of wafers and substrates up to 6 inches (150mm) in size to complete the lithography process. It is often used for processing 2 - 6 - inch wafers, chips, and non - standard substrates.Performance: There are multiple options for the exposure light source, such as a 350W mercury lamp, providing light of different wavelengths. The microscope is equipped with 5x, 10x, 20x and other objectives to assist in precise alignment. It has a topside alignment function. It supports exposure modes such as proximity, soft contact, hard contact, and vacuum contact. The wafer stage has X, Y, θ fine - adjusters to precisely control movement. It can handle wafers up to 6 inches in size and is compatible with masks up to 7x7 inches. It has a cassette - to - cassette transfer function and a wedge error compensation system to ensure exposure consistency.