EVG EVG 620NT 掩模对准曝光机用途：适用于半导体制造、MEMS 研发、纳米技术及先进封装等领域，可处理最大 6 英寸（150mm）晶圆。能将掩模图案精准转移到晶圆表面，完成光刻制程，也支持纳米压印光刻技术，适用于科研与小规模生产。性能：具备顶部和背面对准功能，对准精度高。支持真空接触、硬接触、软接触、接近式、弯曲模式等曝光模式。采用 350W 汞灯光源（也可选 500W 汞灯光源或升级为 LED 光源），搭配 C 型曝光光学元件，提供 350nm - 450nm 宽带光。拥有自动楔形补偿系统，可提高曝光一致性。操作界面基于微软 Windows 系统，易于使用。设备占地空间小，可从半自动升级为全自动版本 。

Product Name: EVG EVG 620NT Mask AlignerPurpose: It is suitable for fields such as semiconductor manufacturing, MEMS R & D, nanotechnology, and advanced packaging. It can handle wafers up to 6 inches (150mm) in size. It can accurately transfer the mask pattern onto the wafer surface to complete the lithography process and also supports nanoimprint lithography technology, being suitable for scientific research and small - scale production.Performance: It has topside and backside alignment functions with high alignment accuracy. It supports exposure modes such as vacuum contact, hard contact, soft contact, proximity, and bending mode. It uses a 350W mercury lamp light source (a 500W mercury lamp light source can also be selected or upgraded to an LED light source) and is paired with type C exposure optics to provide broadband light of 350nm - 450nm. It has an automatic wedge compensation system to improve exposure consistency. The operation interface is based on the Microsoft Windows system and is easy to use. The equipment occupies a small space and can be upgraded from a semi - automated version to a fully automated version.