卡尔・休斯 KARL SUSS MICROTEC CIC1000 恒光强控制器用途：作为曝光系统关键组件，为掩模对准曝光机提供稳定电源，广泛应用于半导体制造、MEMS 研发、微纳结构制作等领域，确保光刻制程中曝光光源输出稳定，保障光刻图案转移的精准度。性能：能为 1000W 曝光光源稳定供电，适配如 365nm、405nm 等多种波长的曝光光学元件，维持光源输出光强稳定，保障光刻分辨率。具备激光干涉仪为基础的对准系统，可精准测量掩模相对晶圆的位置，误差控制在极小范围，助力高精度光刻。其图像分析软件可分析晶圆表面图案与图像密度，实现 0.25µm 及以上精度的图案定位，还设有交互环境用于图案编辑修改及预览显示 。

Product Name: KARL SUSS MICROTEC CIC1000 Constant Intensity ControllerPurpose: As a key component of the exposure system, it provides a stable power supply for mask aligners. It is widely used in fields such as semiconductor manufacturing, MEMS R & D, and micro - nano structure fabrication, ensuring the stable output of the exposure light source during the lithography process and guaranteeing the accuracy of lithography pattern transfer.Performance: It can stably power a 1000W exposure light source and is compatible with exposure optics of various wavelengths such as 365nm and 405nm, maintaining the stability of the light intensity output by the light source and ensuring lithography resolution. It has an alignment system based on a laser interferometer that can accurately measure the position of the mask relative to the wafer, controlling errors within a very small range to facilitate high - precision lithography. Its image analysis software can analyze the patterns and image densities on the wafer surface, achieving pattern positioning accuracy of 0.25µm and above. It also has an interactive environment for pattern editing, modification, and preview display.