阿斯麦 ASML PAS 2500 / 45用途：用于半导体芯片制造，将掩模版上的电路图形精准转移至涂有光刻胶的晶圆表面，适用于 0.7 微米制程的集成电路生产，可处理 3 英寸、4 英寸、5 英寸及 6 英寸晶圆，常用于制造逻辑芯片、存储芯片等 。性能：采用 365nm i-line 光源，搭配数值孔径 0.40 的 i-line 镜头，像场直径 21.1mm ，可实现 0.7 微米分辨率 。该设备针对 i-line 工艺下 0.7 微米以下的生产分辨率进行了优化，具备良好的套刻性能，能有效保障芯片制造过程中图形转移的准确性与稳定性，助力提升芯片生产效率与良品率 。

Product Name: ASML PAS 2500 / 45Purpose: It is used in semiconductor chip manufacturing to accurately transfer the circuit patterns on the photomask to the surface of the wafer coated with photoresist. It is suitable for the production of integrated circuits with a 0.7 - micron process and can process 3 - inch, 4 - inch, 5 - inch, and 6 - inch wafers. It is often used to manufacture logic chips, memory chips, etc.Performance: It adopts a 365nm i-line light source and is equipped with a 0.40 numerical aperture i-line lens with an image field diameter of 21.1mm, which can achieve a resolution of 0.7 microns. The equipment is optimized for production resolutions below 0.7 microns in i-line processes. It has good overlay performance, which can effectively ensure the accuracy and stability of pattern transfer during the chip manufacturing process, helping to improve chip production efficiency and yield.