OAI 2000SM 边缘曝光系统用途：采用标准荫罩技术，为边缘珠去除提供经济有效的方法。适用于需要对基板边缘进行处理的高产量生产场景，可快速简便地完成掩模和基板的转换。性能：基于 OAI 成熟可靠的平台构建。配备 UV 光源，能提供发散半角小于 2.0% 的可调节强度光束，电源功率范围为 200W 至 2000W 。强度控制器传感器直接连接到光源，以实现精确的强度监测。搭载微处理器控制的自动化基板处理子系统，可根据不同基板尺寸进行编程设定。荫罩功能使基板在靠近掩模时，能对其顶部进行图案化，在 25 微米的间距下，分辨率可达 6 微米。

Product Name: OAI 2000SM Edge - bead Exposure SystemPurpose: It provides a cost - effective method for edge - bead removal using standard shadow mask technology. It is suitable for high - volume production scenarios where substrate edge treatment is required, and can quickly and easily complete the changeover of masks and substrates.Performance: Built on OAI's proven and reliable platform. It is equipped with a UV light source that can provide adjustable intensity beams with a divergence half - angle of less than 2.0%, and the power supply ranges from 200W to 2000W. The intensity controller sensor is directly connected to the light source for accurate intensity monitoring. It is equipped with a microprocessor - controlled automated substrate handling subsystem that can be programmed according to different substrate sizes. The shadow mask function enables patterning on the top of the substrate when it is close to the mask. At a spacing of 25 microns, the resolution can reach 6 microns.