OAI 8008AIR-101142 掩模对准曝光机用途：主要应用于半导体、MEMS（微机电系统）以及其他微纳制造领域。可将掩模上的精细图案精准转移至晶圆或各类基底材料表面，完成光刻工艺制程。性能：暂未获取到具体该型号设备明确的官方性能参数。推测其可能具备高精度对准系统，能实现微米级甚至更高精度的图案对准；或许配备稳定的曝光光源系统，确保曝光过程中光强均匀性良好，以保障图案转移的准确性；同时，可能支持多种尺寸晶圆或基底材料的处理，具备一定的操作灵活性。

Product Name: OAI 8008AIR - 101142 Mask AlignerPurpose: It is mainly applied in semiconductor, MEMS (Micro - Electro - Mechanical Systems), and other micro - nano manufacturing fields. It can accurately transfer the fine patterns on the mask onto the surface of wafers or various substrate materials, completing the lithography process.Performance: Specific official performance parameters of this model have not been obtained yet. Presumably, it may be equipped with a high - precision alignment system, enabling micron - level or even higher - precision pattern alignment. It may also be equipped with a stable exposure light source system to ensure good light intensity uniformity during exposure, guaranteeing the accuracy of pattern transfer. At the same time, it may support the processing of wafers or substrate materials of various sizes, with certain operational flexibility.