佳能 CANON MPA 600 Super 掩模对准曝光机用途：适用于半导体制造、集成电路生产、微机电系统研发等领域，可处理 4 - 6 英寸晶圆，用于将掩模图案精准转移至晶圆表面，完成光刻制程，满足芯片、传感器等微小精密部件的制造及科研需求。性能：分辨率可达 1.5μm 。采用 2kW 高压汞灯作为照明光源，在 1800W 功率输出时提供稳定光照。具备自动温度控制系统，能将系统温度控制在 ±3℃内。拥有自动气动失真控制功能，可实现精细的失真补偿。支持 4 - 6 英寸晶圆尺寸及 5 - 7 英寸掩模尺寸，具备单双片、盒对盒、背面晶圆处理功能。采用 1:1 镜像投影技术，提升了套刻精度，具备更高的吞吐量与稳定性，在光刻作业中能保证图案转移的准确性和高效性 。

Product Name: CANON MPA 600 Super Mask AlignerPurpose: It is applicable to fields such as semiconductor manufacturing, integrated circuit production, and micro - electromechanical systems R & D. It can process 4 - 6 - inch wafers, accurately transfer the mask pattern onto the wafer surface to complete the lithography process, and meet the manufacturing and research needs of tiny and precise components such as chips and sensors.Performance: The resolution can reach 1.5μm. It uses a 2kW high - pressure mercury lamp as the illumination light source, providing stable illumination at a power output of 1800W. It has an automatic temperature control system that can control the system temperature within ±3℃. It has an automatic pneumatic distortion control function, which can achieve fine distortion compensation. It supports wafer sizes of 4 - 6 inches and mask sizes of 5 - 7 inches, and has single/double - piece, cassette - to - cassette, and back - side wafer handling functions. It adopts 1:1 mirror projection technology, which improves the overlay accuracy, has higher throughput and stability, and can ensure the accuracy and high - efficiency of pattern transfer during lithography operations.