ABM ABM/6/350/NUV/DCCD/M用途：这是一款由 ABM 公司生产的光刻机，适用于 6 英寸及以下基片的光刻工艺，可用于蓝光 LED、红光 LED、绿光 LED、白光 LED、TFT-LCD 光刻、OLED 光刻等的研发与生产，在微光学、微电路、MEMS、微流道等领域发挥作用 。性能：采用 350 瓦近紫光（NUV）光源，设有 2 频道光强或功率恒定控制装置。具备双 CCD、双面对准系统，CCD 图像倍率在 180x - 1200x 之间，配备 2 个 17 寸 LCD 监视器 。可支持 2、4、6 英寸方基片以及 2、3、4、5、6 英寸圆基片。365nm 光强密度为 18 - 20mW/cm²，400nm 光强密度为 30 - 35mW/cm²；光强均匀性方面，50mm 口径 <±1%，100mm 口径 <±2%，150mm 口径 <±3% 。分辨率可达 0.6um（接触式）、1um（接近式），正面对准精度为 ±0.5um 。

Product Name: ABM ABM/6/350/NUV/DCCD/MPurpose: This is a lithography machine produced by ABM. It is suitable for lithography processes of substrates of 6 inches and below. It can be used in the research and production of blue LED, red LED, green LED, white LED, TFT - LCD lithography, OLED lithography, etc., and plays a role in fields such as micro - optics, micro - circuits, MEMS, and micro - fluidics.Performance: It uses a 350 - watt near - ultraviolet (NUV) light source and is equipped with a two - channel light intensity or power constant control device. It has a dual - CCD, dual - side alignment system with a CCD image magnification between 180x - 1200x and is equipped with two 17 - inch LCD monitors. It can support 2 - inch, 4 - inch, and 6 - inch square substrates as well as 2 - inch, 3 - inch, 4 - inch, 5 - inch, and 6 - inch round substrates. The light intensity density at 365nm is 18 - 20mW/cm², and at 400nm it is 30 - 35mW/cm². In terms of light intensity uniformity, it is <±1% for a 50mm aperture, <±2% for a 100mm aperture, and <±3% for a 150mm aperture. The resolution can reach 0.6um (contact mode) and 1um (proximity mode), and the front - side alignment accuracy is ±0.5um.