卡尔・休斯 KARL SUSS MICROTEC 260MS022 光刻曝光系统用途：该设备属于光刻曝光系统，主要应用于半导体制造领域，可精准地将掩模图案转移至晶圆表面，完成光刻制程，适用于最大 6 英寸晶圆的加工。性能：配置 350W 曝光单元，能提供满足光刻需求的能量。具备 x、y、omega 调节平台，可对晶圆位置进行精确调整，搭配显微镜操控装置，方便操作人员进行精准的对准操作 。通过这些配置，可实现较高精度的光刻，助力半导体芯片等产品的制造 。

Product Name: KARL SUSS MICROTEC 260MS022 Lithography Exposure SystemPurpose: This equipment is a lithography exposure system, mainly used in the semiconductor manufacturing field. It can accurately transfer the mask pattern onto the wafer surface to complete the lithography process and is suitable for processing wafers up to 6 inches in size.Performance: It is equipped with a 350W exposure unit, which can provide the energy required for lithography. It has x, y, omega adjustment platforms, which can precisely adjust the position of the wafer. It is equipped with a microscope control device, which is convenient for operators to perform precise alignment operations. Through these configurations, high - precision lithography can be achieved, contributing to the manufacturing of semiconductor chips and other products.