OAI 804MBA-086265 前后面掩模对准曝光机用途：用于半导体、微机电系统（MEMS）等微纳制造领域，可将掩模图案精准转移至晶圆等基底，完成光刻制程。性能：配备 0130 - 043 - 16 灯壳，其反射镜适用 260nm，传感器支持 260/365nm，搭配 500W 深紫外（DUV）灯，需 0.20 英寸的水冷却排气；带有 nanolithosolutions 真空吸盘及控制器；具备多台电脑显示器、操作手册及众多配件；设备外观良好但有一定使用痕迹，整体未包装尺寸约为 63 英寸长 ×48 英寸宽 ×40 英寸高 。

Product Name: OAI 804MBA - 086265 Front and Backside Mask AlignerPurpose: It is used in micro - nano manufacturing fields such as semiconductors and MEMS. It can accurately transfer the mask pattern onto wafers and other substrates to complete the lithography process.Performance: Equipped with a 0130 - 043 - 16 lamp housing, with a mirror suitable for 260nm, a sensor supporting 260/365nm, and a 500W deep - ultraviolet (DUV) lamp, requiring 0.20 - inch water - cooled exhaust. It comes with a nanolithosolutions vacuum chuck and controller, multiple computer monitors, an operation manual, and numerous accessories. The device has a good appearance but shows some signs of use. The overall unpacked size is approximately 63 inches long × 48 inches wide × 40 inches high.