卡尔・休斯 KARL SUSS MICROTEC MA-150 掩模对准曝光机用途：适用于半导体制造、微机电系统（MEMS）、光电子等领域，可将掩模图案精准转移到晶圆等基底表面，完成光刻制程，常用于化合物半导体工艺（如高亮发光二极管、功率器件、RF - MEMS 等）以及先进封装（如 3D 圆晶级芯片尺寸封装）。性能：可处理最大 6 英寸晶圆，采用盒对盒式操作。具备顶部和底部对准功能，直接对准精度可达 0.7μm，底部对准精度优于 ±1.5μm 。有 350W 或 1000W 汞灯光源，曝光波长 320nm 。配备 5 倍、10 倍、20 倍物镜的显微镜光学系统，通过日立分屏显示器辅助观察，有分屏、全左或全右画面显示模式，可进行聚焦、图像抓取及亮度调节。操纵杆控制能实现 1 微米精度的微调，可调整掩模或显微镜位置，XY 方向及 Theta 角度均可调节。支持接近式、软接触、硬接触（搭配 4 英寸卡盘）、真空接触（搭配 4 英寸卡盘）等多种曝光模式 。

Product Name: KARL SUSS MICROTEC MA - 150 Mask AlignerPurpose: It is suitable for fields such as semiconductor manufacturing, MEMS (Micro - Electro - Mechanical Systems), and optoelectronics. It can accurately transfer the mask pattern onto the surface of wafers and other substrates to complete the lithography process. It is often used in compound semiconductor processes (such as high - brightness light - emitting diodes, power devices, RF - MEMS, etc.) and advanced packaging (such as 3D wafer - level chip - size packaging).Performance: It can handle wafers up to 6 inches in size and adopts cassette - to - cassette operation. It has top - side and bottom - side alignment functions. The direct alignment accuracy can reach 0.7μm, and the bottom - side alignment accuracy is better than ±1.5μm. It has a 350W or 1000W mercury lamp light source with an exposure wavelength of 320nm. It is equipped with a microscope optical system with 5x, 10x, and 20x objectives. The Hitachi split - screen monitor assists in observation, with split - screen, full left - hand or full right - hand screen display modes, and functions such as focus, image capture, and brightness adjustment are available. The joystick control can achieve fine - tuning with an accuracy of 1 micron, and can adjust the position of the mask or microscope. The XY directions and Theta angle can all be adjusted. It supports multiple exposure modes such as proximity, soft contact, hard contact (with a 4 - inch chuck), and vacuum contact (with a 4 - inch chuck).