迈达斯 MIDAS MDA-60FA 掩模对准曝光机用途：适用于陶瓷及探针卡等领域，可将掩模图案精准转移到基底材料上，完成光刻制程，用于制造相关的微纳结构。性能：采用半自动化设计，具备高重复光刻精度和可靠操作。支持 PLC 与 PC 控制，拥有图像采集、数据记录及自动对齐功能。提供 100 多个程序配方，能实现全自动舞台运动。对准精度可达 1μm ，在光刻制程中保障图案转移的准确性。吞吐量最高可达 120WPH，可满足一定规模的生产需求，适配多种基底尺寸及加工方式。

Product Name: MIDAS MDA - 60FA Mask AlignerPurpose: It is suitable for fields such as ceramics and probe cards. It can accurately transfer the mask pattern onto the substrate material to complete the lithography process and is used to manufacture related micro - nano structures.Performance: It adopts a semi - automated design with high - repeat lithography accuracy and reliable operation. It supports PLC and PC control and has functions such as image acquisition, data recording, and automatic alignment. It provides more than 100 program recipes and can achieve fully automatic stage movement. The alignment accuracy can reach 1μm, ensuring the accuracy of pattern transfer in the lithography process. The throughput can reach up to 120WPH, which can meet the production requirements of a certain scale and is suitable for a variety of substrate sizes and processing methods.