佳能 CANON MPA 500 Fab 掩模对准曝光机（光刻机）

用途：适用于中小规模芯片制造企业，也可用于高校和科研机构的微纳加工实验与研发。支持 3 英寸至 5 英寸晶圆的光刻作业，能将掩膜版上的电路图案转移到涂有光刻胶的晶圆上，助力芯片制造及相关科研项目2。

性能：采用 1:1 镜面投影光学系统。分辨率可达 0.5μm，套刻精度为 ±0.3μm。曝光区域为 15×15mm。光源为高性能汞灯，适用于 i - line（365nm）光刻工艺。自动上料装置可处理单晶圆、盒对盒、背面晶圆，可适配 4 英寸至 6 英寸掩模版24。

Product Name: CANON MPA 500 Fab Mask Aligner (Lithography Machine)

Purpose: It is suitable for small - and medium - scale chip manufacturing enterprises, as well as for micro - nano processing experiments and R & D in universities and research institutions. It supports lithography operations for 3 - inch to 5 - inch wafers, and can transfer the circuit patterns on the mask to the wafer coated with photoresist, facilitating chip manufacturing and related scientific research projects2.

Performance: It adopts a 1:1 mirror - projection optical system. The resolution can reach 0.5μm, and the overlay accuracy is ±0.3μm. The exposure area is 15×15mm. The light source is a high - performance mercury lamp, suitable for the i - line (365nm) lithography process. The automatic feeder can handle single wafers, cassette - to - cassette, and back - side wafers, and can be adapted to 4 - inch to 6 - inch masks24.