OAI Hybralign 200 掩模对准曝光机用途：适用于半导体、MEMS、光学器件等微纳制造领域，可将掩模图案精确转移到晶圆或其他基底材料上，助力微结构的制作。性能：能处理 5mm 至 6 英寸（150mm）的晶圆及多种材料，如玻璃、陶瓷等；配备 500W 的近紫外灯源和 uv400 光学元件，支持 365nm 和 400nm 波长曝光；拥有可互换的掩模夹具和卡盘；具备手动和半自动操作模式，以及非接触、软接触和软 - 硬真空接触等曝光模式；对准精度通过 x、y、z 轴千分尺调节，可实现微米级图案转移；配备立体变焦显微镜及照明控制器辅助操作 。

Product Name: OAI Hybralign 200 Mask AlignerPurpose: It is suitable for micro - nano manufacturing fields such as semiconductors, MEMS, and optical devices. It can accurately transfer the mask pattern onto wafers or other substrate materials, facilitating the fabrication of microstructures.Performance: It can process wafers ranging from 5mm to 6 inches (150mm) and various materials like glass and ceramic. It is equipped with a 500W near - ultraviolet light source and uv400 optical components, supporting exposures at 365nm and 400nm wavelengths. It has interchangeable mask holders and chucks. It offers manual and semi - automatic operation modes, as well as exposure modes such as non - contact, soft contact, and soft - through - hard vacuum contact. The alignment accuracy is adjusted by micrometers on the x, y, and z - axes, enabling micron - scale pattern transfer. It is equipped with a stereo - zoom microscope and an illumination controller to assist in operation.