阿斯麦 ASML AT-850D用途：是一款用于光学光刻的 4 轴精密镜头对准设备，属于全自动深紫外（DUV）157nm 浸没式光刻系统，旨在生产集成电路（IC）产品，满足半导体行业对先进制程的需求，为芯片制造提供精准光刻支持 。性能：该设备于 2004 年推出，数值孔径达 0.80 ，可实现 100nm 制程，助力 110nm 逻辑和存储芯片的大规模生产 。它配备大工作区域，便于晶圆对准和基板移动，搭载先进软件，具备图案识别和光刻操作功能。其步重复特性可实现快速图案复制，加速光刻进程。独特四轴机器搭配精密移动台与 xy CCD 计量工具，用于套刻测量和缺陷检测，能精准在不同图案区域间切换坐标，提升晶圆一致性。还集成真空负载锁定模块，与光刻工作流程无缝衔接，高压像差校正设备可减少光学畸变，实现高精度图案化 。

Product Name: ASML AT-850DPurpose: It is a 4 - axis precision lens alignment equipment for optical lithography. It belongs to a fully automated deep ultraviolet (DUV) 157nm immersion lithography system, aiming to produce integrated circuit (IC) products, meeting the needs of the semiconductor industry for advanced processes and providing precise lithography support for chip manufacturing.Performance: Launched in 2004, the device has a numerical aperture of up to 0.80, enabling a 100nm process and facilitating the mass production of 110nm logic and memory chips. It is equipped with a large working area, facilitating wafer alignment and substrate movement, and is equipped with advanced software with pattern recognition and lithography operation functions. Its step - and - repeat feature can achieve rapid pattern replication, accelerating the lithography process. The unique four - axis machine is equipped with a precision moving table and an xy CCD metrology tool, which are used for overlay measurement and defect inspection. It can accurately switch coordinates between different pattern areas, improving wafer uniformity. It also integrates a vacuum load - lock module, seamlessly connecting with the lithography workflow, and the high - pressure aberration correction equipment can reduce optical distortion and achieve high - precision patterning.