佳能 CANON FPA 2500 i2 步进式光刻机用途：适用于半导体制造领域，用于将电路图案精准转移到晶圆上，可处理 6 英寸晶圆，满足芯片生产中光刻环节需求，助力逻辑芯片、存储芯片等制造。性能：采用 i 线光刻技术，光源波长 365nm。配备数值孔径 0.54/0.45 的光学系统，分辨率达 0.45μm。照明光源为 1.5kw 超高压汞灯，照明均匀性≤1.2%。具备 TTL 离轴氦氖电视和 TTL 离轴宽带电视对准模式，对准光源为氦氖激光（633nm）和卤素灯，对准精度≤0.1μm（均值 + 3σ）。每小时吞吐量≥52 片晶圆（8 英寸，60 次曝光），可使用 6 英寸掩模版 。

Product Name: CANON FPA 2500 i2 Wafer StepperPurpose: It is suitable for the semiconductor manufacturing field and is used to accurately transfer circuit patterns onto wafers. It can process 6 - inch wafers, meeting the requirements of the lithography process in chip production and facilitating the manufacturing of logic chips, memory chips, etc.Performance: It adopts i - line lithography technology with a light source wavelength of 365nm. It is equipped with an optical system with a numerical aperture of 0.54/0.45, and the resolution can reach 0.45μm. The illumination light source is a 1.5kw ultra - high - pressure mercury lamp, and the illumination uniformity is ≤1.2%. It has TTL off - axis He - Ne TV and TTL off - axis broadband TV alignment modes. The alignment light sources are He - Ne laser (633nm) and halogen lamp, and the alignment accuracy is ≤0.1μm (mean + 3σ). The throughput is ≥52 wafers per hour (8 - inch, 60 exposures), and a 6 - inch reticle can be used.