卡尔・休斯 KARL SUSS MICROTEC MA 14 掩模对准曝光机用途：适用于半导体制造、MEMS 研发、微纳结构制作等领域，可将掩模图案精准转移到最大 4 英寸的晶圆或其他基底表面，完成光刻制程。也常用于处理小尺寸芯片及非标准基底。性能：曝光光源为 350W 汞灯，输出多种波长光线。显微镜配备 5 倍、10 倍物镜，辅助精确对准，具备顶部对准功能。支持接近式、软接触、硬接触、真空接触等曝光模式。晶圆台具备 X、Y、θ 微调器，可控制移动。能处理最大 4 英寸晶圆，兼容最大 5 英寸的掩模。具备楔形误差补偿系统，保障曝光一致性。

Product Name: KARL SUSS MICROTEC MA 14 Mask AlignerPurpose: It is suitable for fields such as semiconductor manufacturing, MEMS R & D, and micro - nano structure fabrication. It can accurately transfer the mask pattern onto the surface of wafers or other substrates up to 4 inches in size to complete the lithography process. It is also often used for processing small - sized chips and non - standard substrates.Performance: The exposure light source is a 350W mercury lamp, which outputs light of multiple wavelengths. The microscope is equipped with 5x and 10x objectives to assist in precise alignment and has a topside alignment function. It supports exposure modes such as proximity, soft contact, hard contact, and vacuum contact. The wafer stage has X, Y, θ fine - adjusters to control movement. It can handle wafers up to 4 inches in size and is compatible with masks up to 5 inches. It is equipped with a wedge error compensation system to ensure exposure consistency.