阿斯麦 ASML AT400S用途：属于光刻设备，用于半导体芯片制造领域。在芯片制造流程中，它通过光线将掩模版上的电路图案投射到晶圆表面的光刻胶上，经后续处理实现电路图形转移，助力集成电路产品制造，主要适用于较成熟制程芯片的生产 。性能：该设备于 2001 年推出，采用 365nm（i-line）光源 。虽然缺乏更详细的官方参数，但从同类产品推测，其可能具备一定数值孔径，能实现相应分辨率的光刻，满足当时如 250nm 等制程需求 。设备具备自动对焦等功能，可在光刻过程中保证图案投射的精准度，为芯片制造提供稳定、可靠的光刻支持 。

Product Name: ASML AT400SPurpose: It belongs to lithography equipment and is used in the semiconductor chip manufacturing field. In the chip manufacturing process, it projects the circuit patterns on the photomask onto the photoresist on the wafer surface through light, and realizes the transfer of circuit patterns after subsequent processing, contributing to the manufacturing of integrated circuit products. It is mainly suitable for the production of chips with relatively mature processes.Performance: The device was launched in 2001 and uses a 365nm (i-line) light source. Although there are no more detailed official parameters, it is speculated from similar products that it may have a certain numerical aperture and can achieve lithography with corresponding resolution to meet the process requirements such as 250nm at that time. The equipment has functions such as auto - focus, which can ensure the accuracy of pattern projection during the lithography process and provide stable and reliable lithography support for chip manufacturing.