佳能 CANON FPA 2000 i1 步进式光刻机用途：适用于半导体制造领域，常用于化合物衬底或 MEMS 制造，可处理 4 - 8 英寸晶圆，将掩模图案精准转移至晶圆表面，完成光刻制程，助力模拟芯片、车载芯片等产品制造。性能：采用 i 线光刻技术，光源波长 365nm。配备数值孔径 0.50 的光学系统，分辨率达 0.5μm。照明光源为 1.5kW 超高压汞灯，照明均匀性≤1.2%。具备 TV 预对准（TVPA）和晶圆自动对准（AA）功能，对准精度≤0.1μm（均值 + 3σ）。可使用 5 英寸掩模版，支持 0.18μm 或 0.13μm 光刻工艺 。

Product Name: CANON FPA 2000 i1 Wafer StepperPurpose: It is suitable for the semiconductor manufacturing field, often used in the manufacturing of compound substrates or MEMS. It can process 4 - 8 - inch wafers, accurately transfer the mask pattern onto the wafer surface to complete the lithography process, and facilitate the manufacturing of products such as analog chips and automotive chips.Performance: It adopts i - line lithography technology with a light source wavelength of 365nm. It is equipped with an optical system with a numerical aperture of 0.50, and the resolution can reach 0.5μm. The illumination light source is a 1.5kW ultra - high - pressure mercury lamp, and the illumination uniformity is ≤1.2%. It has TV pre - alignment (TVPA) and wafer auto - alignment (AA) functions, and the alignment accuracy is ≤0.1μm (mean + 3σ). A 5 - inch reticle can be used, and it supports lithography processes of 0.18μm or 0.13μm.