卡尔・休斯 KARL SUSS MICROTEC MJB-55 掩模对准曝光机用途：适用于半导体制造、MEMS、微纳加工等领域，用于将掩模上的图案精确转移到晶圆或其他基板上，完成光刻制程。性能：可处理多种尺寸晶圆及基板，最大可支持至 6 英寸。具备高精度对准系统，对准精度可达 ±2μm ，确保图案转移的准确性。采用高强度紫外光源，曝光波长范围为 350 - 450nm，可满足不同光刻胶对波长的需求。曝光均匀性良好，在整个曝光区域内光强偏差极小，能保障光刻图案质量。设备操作简便，可通过自动化程序控制，提高生产效率。

Product Name: KARL SUSS MICROTEC MJB - 55 Mask AlignerPurpose: It is suitable for fields such as semiconductor manufacturing, MEMS, and micro - nano processing. It is used to accurately transfer the patterns on the mask onto wafers or other substrates to complete the lithography process.Performance: It can handle wafers and substrates of various sizes, with a maximum support of up to 6 inches. It is equipped with a high - precision alignment system, and the alignment accuracy can reach ±2μm, ensuring the accuracy of pattern transfer. It adopts a high - intensity ultraviolet light source with an exposure wavelength range of 350 - 450nm, which can meet the wavelength requirements of different photoresists. The exposure uniformity is good, and the light intensity deviation in the entire exposure area is extremely small, which can ensure the quality of lithography patterns. The equipment is easy to operate and can be controlled by an automated program to improve production efficiency.