卡尔・休斯 KARL SUSS MICROTEC MA 1006 掩模对准曝光机用途：适用于半导体制造、MEMS 研发等领域，能将掩模图案精准转移到晶圆表面，完成光刻制程。主要用于处理 6 英寸晶圆，也可用于相关科研与小规模生产。性能：配备 1000W 电源，分辨率可达 1μm 。具备底部对准（BSA）功能，有 5 个 BSA 卡盘，也有顶部对准（TSA）卡盘 。拥有方形（2 英寸、5 英寸）和圆形（2.5 英寸、5 英寸）掩模支架。支持多种曝光模式，可满足不同工艺需求。

Product Name: KARL SUSS MICROTEC MA 1006 Mask AlignerPurpose: It is suitable for fields such as semiconductor manufacturing and MEMS R & D. It can accurately transfer the mask pattern onto the wafer surface to complete the lithography process. It is mainly used for processing 6 - inch wafers and can also be used for related scientific research and small - scale production.Performance: It is equipped with a 1000W power supply and the resolution can reach 1μm. It has a bottom - side alignment (BSA) function with 5 BSA chucks, and also has topside alignment (TSA) chucks. It has square (2 - inch, 5 - inch) and circular (2.5 - inch, 5 - inch) mask holders. It supports multiple exposure modes to meet different process requirements.