佳能 CANON PLA 600 FA 掩模对准曝光机用途：适用于半导体制造、集成电路生产等领域，可处理 4 英寸、5 英寸、6 英寸晶圆，将掩模图案精准转移至晶圆表面，完成光刻制程。性能：采用 250W 汞灯，波长涵盖 365nm（i-line）、405nm（h-line）、436nm（g-line）。接触式印刷分辨率达 1.5μm（使用正性光刻胶）。支持自动上下料，可实现盒对盒操作，且有背面晶圆处理功能。具备自动对准功能，采用氦氖（633nm）激光束扫描，对准精度 3σ≤0.54μm ，强度 / 曝光均匀性在 ±3% 以内。可适配 5 英寸、6 英寸、7 英寸掩模 。

Product Name: CANON PLA 600 FA Mask AlignerPurpose: It is suitable for fields such as semiconductor manufacturing and integrated circuit production. It can process 4 - inch, 5 - inch, and 6 - inch wafers and accurately transfer the mask pattern onto the wafer surface to complete the lithography process.Performance: It uses a 250W mercury lamp with wavelengths covering 365nm (i - line), 405nm (h - line), and 436nm (g - line). The contact printing resolution reaches 1.5μm (using positive photoresist). It supports automatic loading and unloading, can achieve cassette - to - cassette operation, and has a back - side wafer handling function. It has an automatic alignment function, using a helium - neon (633nm) laser beam for scanning. The alignment accuracy is 3σ≤0.54μm, and the intensity/exposure uniformity is within ±3%. It can be adapted to 5 - inch, 6 - inch, and 7 - inch masks.