佳能 CANON PLA 600 转换套件用途：该转换套件用于对佳能 PLA 600 掩模对准曝光机进行升级改造，提升设备性能或拓展其功能，从而满足不同的生产需求，例如优化曝光流程、适配新型晶圆尺寸或改进掩模对准方式等，让原有设备能更好地服务于半导体制造、集成电路生产等领域。性能：通过该转换套件，可优化 PLA 600 曝光机的曝光间隙均匀性，使间隙精度控制在 ±2μm 以内，保证曝光的一致性和稳定性 。可实现对晶圆转换功能的升级，能够适配 3 英寸至 6 英寸多种规格的晶圆，拓展设备的适用范围。在对准功能方面，借助套件升级后，对准精度可提升至 ±0.3μm，有效提高图案转移的准确性，进而提升产品的制造质量 。

Product Name: CANON Conversion kit for PLA 600Purpose: This conversion kit is used to upgrade the CANON PLA 600 mask aligner, improve its performance or expand its functions, so as to meet different production requirements. For example, it can optimize the exposure process, adapt to new wafer sizes, or improve the mask alignment method, enabling the original equipment to better serve in fields such as semiconductor manufacturing and integrated circuit production.Performance: With this conversion kit, the exposure gap uniformity of the PLA 600 aligner can be optimized, and the gap accuracy can be controlled within ±2μm, ensuring the consistency and stability of exposure. It can realize the upgrade of the wafer conversion function and be able to adapt to wafers of various specifications from 3 inches to 6 inches, expanding the applicable range of the equipment. In terms of the alignment function, after the upgrade with the kit, the alignment accuracy can be improved to ±0.3μm, effectively improving the accuracy of pattern transfer and thus enhancing the manufacturing quality of products.