阿斯麦 ASML PAS 5500 / 100C用途：用于半导体芯片制造，可将掩模版上的电路图形精准转移至涂有光刻胶的晶圆表面，适用于 0.4µm 制程的大规模集成电路生产，助力逻辑芯片、存储芯片等产品制造 。性能：采用 365nm i-line 光源，搭配数值孔径可变的镜头 ，能实现 0.4µm 分辨率 。具备较高的生产效率，每小时可处理一定数量晶圆 。该设备在可变数值孔径保持最大功能性的同时实现极高的吞吐量，其先进的设计可有效保障芯片制造过程中图形转移的准确性与稳定性 。

Product Name: ASML PAS 5500 / 100CPurpose: It is used in semiconductor chip manufacturing. It can accurately transfer the circuit patterns on the photomask to the surface of the wafer coated with photoresist. It is suitable for the mass production of integrated circuits with a 0.4µm process, contributing to the manufacturing of products such as logic chips and memory chips.Performance: It adopts a 365nm i-line light source and is equipped with a lens with variable numerical aperture, which can achieve a resolution of 0.4µm. It has a high production efficiency and can process a certain number of wafers per hour. The device achieves extremely high throughput while maintaining the maximum functionality of the variable numerical aperture. Its advanced design can effectively ensure the accuracy and stability of pattern transfer during the chip manufacturing process.