阿斯麦 ASML SERV.435.04171用途：因暂缺官方信息，推测该型号为阿斯麦光刻机相关服务或组件。阿斯麦专注半导体芯片制造，光刻机将掩模版电路图形转移至晶圆光刻胶涂层，生产各类芯片。此型号可能用于设备维护、性能优化或特定工艺支持，确保光刻机稳定、精准、高效运行 。性能：目前没有该型号的具体性能参数。阿斯麦作为行业龙头，产品技术先进。如部分光刻机采用 193nm ArF、248nm KrF 等光源，搭配高数值孔径光学系统实现高分辨率光刻，套刻精度高。设备具备双晶圆台技术提升效率，还有全面焦点控制、稳定照明系统保障光刻质量 。

Product Name: ASML SERV.435.04171Purpose: Due to the lack of official information, it is presumed that this model is a service or component related to ASML lithography machines. ASML focuses on semiconductor chip manufacturing, and lithography machines transfer the circuit patterns on the photomask to the photoresist coating on the wafer to produce various types of chips. This model may be used for equipment maintenance, performance optimization, or specific process support to ensure the stable, accurate, and efficient operation of the lithography machine.Performance: There are currently no specific performance parameters for this model. As a leading company in the industry, ASML's products are technologically advanced. For example, some lithography machines use light sources such as 193nm ArF and 248nm KrF, and are equipped with optical systems with high numerical apertures to achieve high - resolution lithography with high overlay accuracy. The equipment has a dual - wafer stage technology to improve efficiency and also has a comprehensive focus control and a stable illumination system to ensure lithography quality.