阿斯麦 ASML 454.40204 - D089用途：因缺乏公开资料，从 ASML 业务范畴推测，该型号大概率是其光刻机相关的关键部件。或许应用于光刻机的光学、机械或电气系统，对光刻机的精准运行、光路传导、部件协同等方面起关键作用，保障光刻时掩模版上的电路图形能精准转移到晶圆表面，服务于半导体芯片制造流程 。性能：由于无具体参数，依据 ASML 产品特性猜测，若为光学部件，可能适配 193nm ArF、248nm KrF 等常见光源，具备高数值孔径，助力 7nm - 14nm 等先进制程实现高分辨率光刻；若属电气组件，应该有精准的电压、电流调控能力，降低电气干扰对光刻精度的影响，维持设备稳定运转；若是机械部件，会具备极高的加工精度和稳定性，使晶圆台等关键部件的运动精度达到亚微米甚至纳米级，契合芯片制造对高精度的严格要求 。

Product Name: ASML 454.40204 - D089Purpose: Due to the lack of public information, inferring from ASML's business scope, this model is most likely a key component related to its lithography machines. It may be applied to the optical, mechanical, or electrical systems of lithography machines, playing a crucial role in aspects such as the precise operation of the lithography machine, light path conduction, and component coordination. It ensures that the circuit patterns on the photomask can be accurately transferred to the wafer surface during lithography, serving the semiconductor chip manufacturing process.Performance: Since there are no specific parameters, guessing based on the characteristics of ASML products, if it is an optical component, it may be adapted to common light sources such as 193nm ArF and 248nm KrF, with a high numerical aperture, helping to achieve high - resolution lithography for advanced processes such as 7nm - 14nm. If it is an electrical component, it should have precise voltage and current regulation capabilities, reducing the impact of electrical interference on lithography accuracy and maintaining the stable operation of the equipment. If it is a mechanical component, it will have extremely high processing accuracy and stability, enabling the movement accuracy of key components such as the wafer stage to reach the sub - micron or even nanometer level, meeting the strict requirements for high precision in chip manufacturing.