阿斯麦 ASML 455.62152 - P064用途：因缺乏具体官方资料，推测该型号可能是阿斯麦光刻机相关组件，服务于半导体芯片制造环节。或许用于光刻机的光学、电气或机械系统，对设备的精准运行、光路传输、部件协同等方面起到关键作用，保障光刻过程中电路图形从掩模版到晶圆的准确转移 。性能：由于未获取到该型号详细性能参数，以阿斯麦光刻机普遍特性推断，若为光学组件，可能适配特定光源（如 193nm ArF、248nm KrF 等），保障高分辨率成像，数值孔径处于行业领先范围，助力实现如 7nm - 14nm 等先进制程光刻需求；若为电气部件，可能具备高精度电压、电流控制能力，确保设备运行稳定，降低电气干扰对光刻精度的影响；若为机械组件，会具备极高的加工精度和稳定性，保证晶圆台等部件运动精度达到亚微米甚至纳米级别 。

Product Name: ASML 455.62152 - P064Purpose: Due to the lack of specific official information, it is presumed that this model may be a component related to ASML lithography machines and serves in the semiconductor chip manufacturing process. It may be used in the optical, electrical, or mechanical systems of lithography machines, playing a key role in aspects such as the precise operation of the equipment, light path transmission, and component coordination, ensuring the accurate transfer of circuit patterns from the photomask to the wafer during the lithography process.Performance: Since detailed performance parameters of this model have not been obtained, inferring from the general characteristics of ASML lithography machines, if it is an optical component, it may be adapted to specific light sources (such as 193nm ArF, 248nm KrF, etc.), ensuring high - resolution imaging, with a numerical aperture within the leading range in the industry, helping to achieve lithography requirements for advanced processes such as 7nm - 14nm. If it is an electrical component, it may have high - precision voltage and current control capabilities to ensure the stable operation of the equipment and reduce the impact of electrical interference on lithography accuracy. If it is a mechanical component, it will have extremely high processing accuracy and stability, ensuring that the movement accuracy of components such as the wafer stage reaches the sub - micron or even nanometer level.