阿斯麦 ASML AT 1200B用途：是一款用于半导体芯片制造的光刻设备。在芯片制造流程中，它通过光线将掩模版上设计好的电路图形精准地转移到涂有光刻胶的晶圆表面，主要用于 90nm 芯片的量产，助力各类半导体芯片的生产 。性能：采用 193nm ArF 光源，数值孔径达 0.93 。其光学系统配置高，成像设备由多组先进光学元件构成，可实现 80nm 分辨率，在高分辨率扫描模式下甚至可达 40nm 。该设备具备自动对焦、光斑尺寸校正等功能，内置轨迹校正单元，能在长距离操作中实现无限视野和快速作业 。机器的智能化图形用户界面操作便捷，还配备了可优化曝光剂量与速度的 DPE 模块 。

Product Name: ASML AT 1200BPurpose: It is a lithography device used in semiconductor chip manufacturing. In the chip manufacturing process, it accurately transfers the pre - designed circuit patterns on the photomask to the surface of the wafer coated with photoresist by means of light. It is mainly used for the mass production of 90nm chips, contributing to the production of various semiconductor chips.Performance: It uses a 193nm ArF light source with a numerical aperture of up to 0.93. Its optical system is highly configured, and the imaging equipment is composed of multiple sets of advanced optical components, which can achieve a resolution of 80nm and even 40nm in high - resolution scan mode. The device has functions such as auto - focus and spot size correction, and is equipped with a built - in trajectory correction unit, which can achieve unlimited field of view and fast operation in long - distance operations. The intelligent graphical user interface of the machine is easy to operate, and it is also equipped with a DPE module that can optimize the exposure dose and speed.