阿斯麦 ASML Chamber for AT 1200B用途：该腔室是 ASML Twinscan AT:1200B 光刻机的关键组件。主要用于为光刻过程提供特定环境，保护内部光学元件、晶圆及其他关键部件。在芯片制造中，腔室需维持稳定的压力、温度等条件，保证光刻过程中光线传播稳定，从而确保将掩模版上的电路图形高精度地转移到晶圆表面，适用于 90nm 芯片量产，助力制造各类半导体芯片 。性能：虽缺乏该腔室具体参数，但从 AT:1200B 整体性能可推测其特性。AT:1200B 采用 193nm 光刻技术，分辨率可达 80nm 。其光学系统配置高，成像设备含多组先进光学元件，数值孔径达 0.93 。腔室需适配此类高精度光学系统，确保内部环境稳定，减少外界干扰，保障光线传播不受影响，为实现高分辨率光刻提供稳定环境 。

Product Name: ASML Chamber for AT 1200BPurpose: This chamber is a key component of the ASML Twinscan AT:1200B lithography machine. It is mainly used to provide a specific environment for the lithography process and protect the internal optical elements, wafers, and other key components. In chip manufacturing, the chamber needs to maintain stable conditions such as pressure and temperature to ensure stable light propagation during the lithography process, thus ensuring that the circuit patterns on the photomask are transferred to the wafer surface with high precision. It is suitable for the mass production of 90nm chips and helps to manufacture various semiconductor chips.Performance: Although specific parameters of this chamber are lacking, its characteristics can be inferred from the overall performance of the AT:1200B. The AT:1200B adopts 193nm lithography technology with a resolution of up to 80nm. Its optical system is highly configured, and the imaging equipment contains multiple sets of advanced optical components with a numerical aperture of 0.93. The chamber needs to be adapted to such a high - precision optical system, ensuring a stable internal environment, reducing external interference, and guaranteeing that light propagation is not affected, providing a stable environment for high - resolution lithography.