阿斯麦 ASML Frame platform（框架平台）用途：ASML Frame platform 是光刻机内用于支撑和固定关键组件的框架结构。它主要为光刻机的光学系统、晶圆台、光源系统等核心部件提供稳定且精准的安装基础，确保各组件在工作过程中保持精确的相对位置关系，以此保障光刻机在芯片光刻制程中，能将掩模版上的电路图形高精度地转移到晶圆表面，服务于各类半导体芯片的制造 。性能：不同光刻机型号对应的 Frame platform 有所差异。例如，应用于极紫外（EUV）光刻机的框架平台，需具备极高的精度和稳定性。其采用特殊铝合金材质，经复杂加工工艺，在保证结构强度的同时减轻重量，能承受严苛的环境应力 。框架平台尺寸较大，以适配大型光学系统，且在加工精度上，可将内部组件位置偏差控制在极小范围，如保障镜片安装精度达到亚微米级，为实现高分辨率光刻、高套刻精度等关键性能指标提供坚实支撑 。

Product Name: ASML Frame platformPurpose: The ASML Frame platform is a frame structure in the lithography machine used to support and fix key components. It mainly provides a stable and precise installation foundation for the core components of the lithography machine, such as the optical system, wafer stage, and light source system, ensuring that each component maintains an accurate relative position during operation. In this way, it guarantees that the lithography machine can transfer the circuit patterns on the photomask to the wafer surface with high precision during the chip lithography process, serving the manufacturing of various semiconductor chips.Performance: The Frame platforms corresponding to different lithography machine models vary. For example, the frame platform applied to extreme ultraviolet (EUV) lithography machines needs to have extremely high precision and stability. It uses special aluminum alloy materials and, through complex processing techniques, reduces weight while ensuring structural strength and can withstand harsh environmental stresses. The frame platform is relatively large in size to adapt to large - scale optical systems. In terms of processing accuracy, the position deviation of internal components can be controlled within a very small range. For example, it can ensure the installation accuracy of lenses to reach the sub - micron level, providing a solid support for achieving key performance indicators such as high - resolution lithography and high overlay accuracy.