卡尔・休斯 KARL SUSS MICROTEC 掩模对准曝光机大量备件用途：这些备件专为卡尔・休斯 KARL SUSS MICROTEC 掩模对准曝光机配套，用于设备日常维护、故障维修以及性能升级。可确保设备稳定运行，延长使用寿命，维持光刻制程的精准度和高效性，满足半导体制造、MEMS 研发、微纳结构制作等领域对设备的持续使用需求。性能：备件涵盖多种关键部件。例如，可能包括 350W 汞灯等曝光光源备件，确保输出稳定的 350nm - 450nm 波长光线，维持 0.6 微米甚至更高的分辨率；有不同尺寸（如 2.5 英寸、3 英寸、4 英寸、5 英寸）的掩模支架备件，适配不同规格的掩模；还有显微镜物镜（如 5x、10x、20x 等）备件，保障精准的对准观察；以及用于控制晶圆台移动的 X、Y、θ 微调器备件等，保证晶圆台移动精度，实现精准光刻 。

Product Name: Lot of spare parts for KARL SUSS MICROTEC mask alignerPurpose: These spare parts are specially designed for KARL SUSS MICROTEC mask aligners. They are used for daily maintenance, equipment repair, and performance upgrades. They can ensure the stable operation of the equipment, extend its service life, maintain the accuracy and high - efficiency of the lithography process, and meet the continuous usage requirements of the equipment in fields such as semiconductor manufacturing, MEMS R & D, and micro - nano structure fabrication.Performance: The spare parts cover a variety of key components. For example, it may include spare parts for exposure light sources such as 350W mercury lamps to ensure the stable output of light with wavelengths of 350nm - 450nm and maintain a resolution of 0.6 microns or even higher; mask holder spare parts of different sizes (such as 2.5 - inch, 3 - inch, 4 - inch, 5 - inch) to adapt to different specifications of masks; microscope objective spare parts (such as 5x, 10x, 20x, etc.) to ensure accurate alignment observation; and X, Y, θ fine - adjuster spare parts for controlling the movement of the wafer stage, etc., to ensure the movement accuracy of the wafer stage and achieve precise lithography.