卡尔・休斯 KARL SUSS MICROTEC MA 56 掩模对准曝光机用途：适用于集成电路制造、MEMS 研发、微纳结构制作等领域，可将掩模图案精准转移到晶圆等基底表面，完成光刻制程。常用于处理 3 - 5 英寸晶圆，也能加工最大尺寸达 4”x4” 的非标准基底或更小芯片 。性能：配备 350W 曝光单元，光源波长可选，如 310nm（30W 氘灯）、365nm（350W 汞弧灯），含 UV - 400 曝光光学元件（365 - 405nm 波长）。分辨率方面，接近式曝光为 3µm，真空接触式曝光达 0.8 - 1µm 。具备 x、y、omega 调节平台及显微镜操控装置，支持手动、半自动或全自动曝光。有盒对盒晶圆传送系统及预对准工位。运行需真空、压缩空气、氮气及 1.1kW 电力等公用设施支持 。

Product Name: KARL SUSS MICROTEC MA 56 Mask AlignerPurpose: It is suitable for fields such as integrated circuit manufacturing, MEMS R & D, and micro - nano structure fabrication. It can accurately transfer the mask pattern onto the surface of wafers and other substrates to complete the lithography process. It is often used for processing 3 - 5 - inch wafers, and can also process non - standard substrates with a maximum size of 4”x4” or smaller chips.Performance: It is equipped with a 350W exposure unit, and the light source wavelengths are optional, such as 310nm (30W deuterium lamp) and 365nm (350W mercury arc lamp), including UV - 400 exposure optics (365 - 405nm wavelength). In terms of resolution, it is 3µm for proximity exposure and 0.8 - 1µm for vacuum contact exposure. It has x, y, omega adjustment platforms and microscope control devices, and supports manual, semi - automatic, or fully automatic exposure. There is a cassette - to - cassette wafer transfer system and a pre - alignment station. It requires utilities such as vacuum, compressed air, nitrogen, and 1.1kW power to operate.