佳能 CANON FPA-6000ES6A 光刻扫描机用途：适用于半导体制造领域，可对 300mm 及 200mm 晶圆进行量产加工，满足 90nm 设计规则及以上制程需求，广泛用于微处理器、彩色滤光片等器件的大规模生产。性能：采用数值孔径为 0.86 的投影光学系统，结合佳能先进的镜头设计与测量技术，可实现 90nm 分辨率光刻。先进灵活照明系统（AFIS）提升特殊照明效率，其灵活模式设置允许用户自定义照明模式。每小时可曝光约 120 片晶圆（WPH），具备高产能。支持 45nm 及以上制程，曝光场尺寸为 26mm×33mm 。

Product Name: CANON FPA-6000ES6A Lithography ScannerPurpose: It is suitable for the semiconductor manufacturing field. It can be used for mass - production processing of 300mm and 200mm wafers, meeting the requirements of 90nm design rules and above process requirements. It is widely used in the large - scale production of devices such as microprocessors and color filters.Performance: It adopts a projection optical system with a numerical aperture of 0.86. Combining Canon's advanced lens design and measurement technology, it can achieve lithography with a resolution of 90nm. The Advanced Flexible Illuminator System (AFIS) improves the efficiency of special illumination, and its flexible mode settings allow users to customize illumination modes. It can expose about 120 wafers per hour (WPH), with high productivity. It supports processes of 45nm and above, and the exposure field size is 26mm×33mm.