佳能 CANON FPA-5500iza 步进式光刻机用途：适用于半导体制造领域，可对 200mm 及 300mm 晶圆进行光刻作业，常用于 350nm 及以上制程工艺，在逻辑芯片、图像传感器等制造中广泛应用，满足大规模生产需求。性能：采用 4.5kW 高压汞灯作为 i-line（365nm 波长）光源，结合高精度光学系统，分辨率可达 0.5μm 。通过光罩放大补偿、Z 轴与倾斜补偿精度提升、平台环境控制及校准精度优化，套刻精度达 16nm。曝光区域为 40×40mm，晶圆平台速度快，处理 200mm 晶圆时产能达 155 片 / 小时，处理 300mm 晶圆时为 93 片 / 小时 。

Product Name: CANON FPA-5500iza Step-and-Repeat Wafer StepperPurpose: It is suitable for the semiconductor manufacturing field. It can perform lithography on 200mm and 300mm wafers. It is often used in process technologies of 350nm and above and is widely applied in the manufacturing of logic chips, image sensors, etc., meeting the needs of large - scale production.Performance: It uses a 4.5kW high - pressure mercury lamp as the i - line (365nm wavelength) light source. Combined with a high - precision optical system, the resolution can reach 0.5μm. Through reticle magnification compensation, improvement in z - axis and tilt compensation accuracy, stage environment control, and calibration accuracy, the overlay accuracy reaches 16nm. The exposure area is 40×40mm. The wafer stage is fast. The productivity is 155 wafers per hour when processing 200mm wafers and 93 wafers per hour when processing 300mm wafers.