日立 HITACHI FB - 2000A用途：利用聚焦高能（30kV）镓离子束，以可控方式对无机样品进行材料去除，主要用于透射电镜（TEM）样品制备和线路图案铣削，也可用于观察样品。技术原理：采用聚焦离子束技术，液态金属离子源（LMIS）产生镓离子形成离子束，经静电透镜聚焦后作用于样品。通过离子与样品物质相互作用实现加工，利用二次电子成像，其离子源为连接镓储液器的钨针。性能：加速电压固定为 30kV ，能提供稳定离子流；配备 TEM 样式的测角仪样品引入系统；具有两种铣削模式和七种光圈设置，可自动切换高速铣削或观察模式；支持软件控制的钨沉积；扫描成像分辨率较高，可满足微米及纳米级别的加工和观察需求 。Product Name: HITACHI FB - 2000APurpose: It uses a focused high - energy (30 kV) gallium ion beam to remove materials from inorganic samples in a controlled manner. It is mainly used for transmission electron microscope (TEM) sample preparation, line pattern milling, and sample observation.Technical Principle: It adopts focused ion beam technology. The liquid metal ion source (LMIS) generates gallium ions to form an ion beam, which is focused by electrostatic lenses and then acts on the sample. Processing is achieved through the interaction between ions and sample materials, and imaging is performed using secondary electrons. Its ion source is a tungsten needle connected to a gallium reservoir.Performance: The accelerating voltage is fixed at 30 kV, which can provide a stable ion flow. It is equipped with a TEM - style goniometer sample introduction system. It has two milling modes and seven aperture settings, which can be automatically switched between high - speed milling and observation modes. It supports software - controlled tungsten deposition. It has a relatively high scanning imaging resolution, which can meet the processing and observation requirements at the micrometer and nanometer levels.