日立 HITACHI S-4800用途：广泛应用于材料科学、生命科学、半导体等领域。可用于观察材料微观结构、生物样品超微形态、半导体芯片细微构造，也能对材料表面微区成分进行定性和定量分析。技术原理：由电子枪发射电子束，在加速电压作用下经磁透镜系统汇聚，聚焦于样品表面，在偏转线圈作用下做光栅状扫描。电子与样品相互作用产生二次电子、背散射电子等信号，探测器收集并转化为光子，经电信号放大器处理后成像于显示系统。性能：二次电子图像分辨率优秀，15kV 下可达 1.0nm，1kV 时，减速模式下为 1.4nm，正常模式下为 2.0nm；放大倍率方面，低倍模式为 20 - 2,000 倍，高倍模式为 100 - 800,000 倍；加速电压范围 0.5 - 30kV，以 0.1kV 为步长调节；样品台为 5 轴电动，X、Y 向行程 0 - 110mm，Z 向行程 1.5 - 40mm，倾斜角度 - 5° 至 70°，旋转角度 360° 。Product Name: Hitachi HITACHI S-4800Purpose: It is widely used in fields such as materials science, life sciences, and semiconductors. It can be used to observe the microstructure of materials, the ultrastructure of biological samples, the fine structure of semiconductor chips, and also perform qualitative and quantitative analysis of the micro-area composition on the material surface.Technical Principle: The electron gun emits an electron beam, which is converged by the magnetic lens system under the action of the acceleration voltage and focused on the sample surface. It performs raster scanning under the action of the deflection coil. The electrons interact with the sample to generate signals such as secondary electrons and backscattered electrons. The detector collects and converts them into photons, which are processed by the electrical signal amplifier and then imaged on the display system.Performance: It has excellent secondary electron image resolution, reaching 1.0nm at 15kV. At 1kV, it is 1.4nm in deceleration mode and 2.0nm in normal mode. In terms of magnification, it is 20 - 2,000 times in low magnification mode and 100 - 800,000 times in high magnification mode. The acceleration voltage ranges from 0.5 - 30kV and can be adjusted in steps of 0.1kV. The sample stage is 5 - axis motorized, with X and Y travel of 0 - 110mm, Z travel of 1.5 - 40mm, tilt angle of - 5° to 70° and rotation angle of 360°.