赛默飞 FEI FIB 800 聚焦离子束系统用途：适用于电路编辑、缺陷与故障分析、透射电镜（TEM）薄片制备、纳米加工、纳米原型制作及微机电系统（MEMS）等领域，助力科研与工业生产中的微观结构研究与样品加工。技术原理：采用 Magnum 离子柱，通过高能离子束与样品表面相互作用，实现如溅射刻蚀、离子植入等操作，用于样品的精确修饰与加工。搭配扫描电镜成像功能，利用电子束扫描样品产生二次电子、背散射电子信号成像，以便实时观察加工过程与样品微观结构 。性能：离子束铣削能力强大，束流最高达 21nA 。加速电压范围 0.5 - 30kV 。分辨率在 25kV 时可达 5nm 。放大倍率 200 - 15000 倍 。可容纳最大直径 200mm 的样品，配备 5 轴电动等心倾斜样品台。还设有多达四个注射器的气体注入系统辅助材料沉积或刻蚀，真空系统包含柱内离子泵、风冷涡轮泵和机械泵 。Product Name: Thermo Fisher FEI FIB 800 Focused Ion Beam SystemPurpose: It is applicable to fields such as circuit editing, defect and failure analysis, transmission electron microscopy (TEM) lamella preparation, nanofabrication, nano prototyping, and microelectromechanical systems (MEMS), facilitating research on microstructure and sample processing in scientific research and industrial production.Technical Principle: It adopts a Magnum ion column. The interaction between a high - energy ion beam and the sample surface enables operations such as sputtering etching and ion implantation for precise modification and processing of samples. It is equipped with scanning electron microscope imaging function. An electron beam scans the sample to generate secondary electron and backscattered electron signals for imaging, allowing real - time observation of the processing process and the sample microstructure.Performance: It has a powerful ion beam milling ability with a maximum beam current of 21nA. The acceleration voltage range is 0.5 - 30kV. The resolution can reach 5nm at 25kV. The magnification is 200 - 15000 times. It can accommodate samples with a maximum diameter of 200mm and is equipped with a 5 - axis motorized eucentric tilt sample stage. It also has a gas injection system with up to four injectors to assist in material deposition or etching, and the vacuum system includes an in - column ion pump, an air - cooled turbo pump, and a mechanical pump.