日立 HITACHI RS-4000 缺陷 review 扫描电子显微镜。用途：主要用于半导体晶圆的缺陷检测与复查，可识别关键缺陷，为提高良品率提供数据支持。技术原理：利用电子束扫描晶圆表面，通过检测电子与样品相互作用产生的信号成像，结合自动缺陷分类（ADC）技术识别缺陷类型。性能：具备每小时 1200 个缺陷（dph）的高吞吐量，是传统型号的约 3 倍。图像分辨率可达 3nm，可通过倾斜电子束进行倾斜图像观察，获取更多缺陷信息1。Product Name：Hitachi HITACHI RS - 4000 Defect Review Scanning Electron Microscope.Purpose：It is mainly used for defect detection and review of semiconductor wafers, which can identify critical defects and provide data support for yield improvement.Technical Principle：It uses an electron beam to scan the wafer surface, and images by detecting the signals generated by the interaction between electrons and the sample. Combined with the Automatic Defect Classification (ADC) technology, it can identify the types of defects.Performance：It has a high - throughput of 1,200 defects per hour (dph), about 3 times faster than the traditional model. The image resolution can reach 3nm, and it can perform tilt image observation by tilting the electron beam to obtain more defect information1.