应用材料 VeritySEM 4i 扫描电子显微镜用途：专为半导体制造的关键尺寸（CD）量测设计，广泛用于 28nm 至 3nm 及更先进制程，如 FinFET、GAA 结构和 3D NAND 生产线。也适用于材料科学中对微观结构的高分辨率成像与分析。技术原理：利用电子枪发射电子束，经电磁透镜聚焦后扫描样品表面。电子与样品作用产生二次电子、背散射电子等信号，探测器收集并转化为图像，以此呈现样品微观特征。结合先进算法与自动化系统，实现精准量测与分析 。性能：具备 1.5nm 的高分辨率，可清晰观察纳米级结构。检测效率高，能快速处理大量数据。拥有出色的图像精度， fleet 匹配精度达 0.3nm。放大倍数范围 3x 至 50kx，视野最大可达 6mm x 6mm。配备先进的能量色散 X 射线光谱（EDS）系统，可检测尺寸小于 10 纳米的元素。还支持自动化测量，如直径、体积、面积和表面粗糙度的测量 。Product Name: Applied Materials VeritySEM 4i Scanning Electron MicroscopePurpose: Specifically designed for critical dimension (CD) metrology in semiconductor manufacturing, it is widely used in 28nm to 3nm and more advanced processes, such as FinFET, GAA structure and 3D NAND production lines. It is also suitable for high-resolution imaging and analysis of microstructures in materials science.Technical Principle: An electron gun is used to emit an electron beam, which is focused by electromagnetic lenses and then scans the sample surface. The interaction between electrons and the sample generates signals such as secondary electrons and backscattered electrons. The detector collects and converts them into images to present the microscopic characteristics of the sample. Combined with advanced algorithms and an automated system, precise measurement and analysis are achieved.Performance: It has a high resolution of 1.5nm, which can clearly observe nanoscale structures. It has high detection efficiency and can quickly process a large amount of data. It has excellent image accuracy, with a fleet matching accuracy of 0.3nm. The magnification range is 3x to 50kx, and the maximum field of view can reach 6mm x 6mm. It is equipped with an advanced energy dispersive X-ray spectroscopy (EDS) system that can detect elements smaller than 10 nanometers in size. It also supports automated measurements, such as diameter, volume, area and surface roughness measurements.