赛默飞 FEI Nova NanoSEM 400 场发射扫描电子显微镜用途：适用于材料科学、纳米技术、生物学、半导体等领域，可对样品进行高分辨率成像与微观分析，助力研究材料微观结构、纳米材料特性、生物样品细微特征及半导体器件缺陷等。技术原理：运用场发射电子枪产生高亮度电子束，经电磁透镜聚焦后扫描样品表面。电子与样品相互作用产生二次电子、背散射电子等信号，探测器收集并转化为图像。结合浸入式透镜技术和 FEI Helix 探测技术，能在低真空环境抑制电荷积累及电子束诱导污染 。性能：二次电子图象分辨率，高真空模式下 15kV 时达 1.0nm、1kV 时为 1.8nm；低真空模式 10kV 时 1.5nm、3kV 时 1.8nm。加速电压 200V - 30kV 连续可调，电子束流范围 0.3pA - 22nA 。样品台为五轴驱动，X、Y 方向移动范围 100mm，Z 方向 60mm；倾斜角度 - 5° 至 + 70°，可 360° 连续旋转。配备能谱仪可进行微区成份分析等 。Product Name: Thermo Fisher FEI Nova NanoSEM 400 Field Emission Scanning Electron MicroscopePurpose: It is applicable to fields such as materials science, nanotechnology, biology, and semiconductors. It can perform high - resolution imaging and microscopic analysis on samples, facilitating the study of material microstructure, nanomaterial properties, fine features of biological samples, and defects of semiconductor devices.Technical Principle: It uses a field emission electron gun to generate a high - brightness electron beam, which is focused by electromagnetic lenses and then scans the sample surface. The interaction between electrons and the sample generates signals such as secondary electrons and backscattered electrons, which are collected by detectors and converted into images. Combining immersion lens technology and FEI Helix detection technology can suppress charge accumulation and electron beam - induced contamination in a low - vacuum environment.Performance: The resolution of secondary electron images in high - vacuum mode reaches 1.0nm at 15kV and 1.8nm at 1kV; in low - vacuum mode, it is 1.5nm at 10kV and 1.8nm at 3kV. The acceleration voltage is continuously adjustable from 200V to 30kV, and the electron beam current range is 0.3pA - 22nA. The sample stage is a five - axis driven stage, with a movement range of 100mm in both the X and Y directions and 60mm in the Z direction. The tilt angle ranges from - 5° to + 70°, and it can rotate continuously by 360°. It is equipped with an energy spectrometer for micro - area composition analysis, etc.